
Micron Chooses to Extend 6F² DRAM While Working Toward 3D Memory
Micron plans to keep developing conventional 6F² DRAM instead of adopting 4F² cells, Tom’s Hardware reports. Its explanation puts capacitor spacing, manufacturing complexity and cost ahead of a smaller nominal transistor footprint.
The Short Version
Micron plans to continue refining conventional 6F² DRAM rather than move to the 4F² architecture, according to Tom’s Hardware. The company argues that the alternative adds manufacturing work and expense without sufficient gains. Its longer-term direction is 3D DRAM, with memory cells stacked vertically.
Why It Matters
The technical distinction concerns what limits the space a memory cell needs. Micron executive Scott DeBoer says capacitor size and spacing determine how densely cells can fit. Making the transistor underneath smaller does not automatically make the complete cell smaller.
That makes a nominal footprint an incomplete guide to practical progress. For someone comparing future memory promises, the useful question is how much usable density a manufacturer can deliver at an acceptable production cost.
The Bigger Picture
Micron’s proposed route keeps improving the existing architecture before a later vertical-stacking transition. Tom’s Hardware reports that the company targets volume production of its 1δ process in the second half of 2027, with a promised density gain in the mid-20% range over its predecessor.
Those are plans, not independently demonstrated results in the supplied report. The strategy also does not establish when a particular computer will receive more memory or become cheaper.
What to Watch
Production results would show whether the planned density improvement arrives on schedule. For 3D DRAM, commercial timing remains undisclosed. Micron’s assessment explains its own choice; it should not be treated as an independent verdict on every rival implementation of 4F².
When judging a memory roadmap, which matters most to you: capacity, cost or the date products actually arrive?